Journal of Applied Probability

The stationary distributions of two classes of reflected Ornstein--Uhlenbeck processes

Xing Xiaoyu, Zhang Wei, and Wang Yongjin

Source: J. Appl. Probab. Volume 46, Number 3 (2009), 709-720.

Abstract

In this paper we consider two classes of reflected Ornstein--Uhlenbeck (OU) processes: the reflected OU process with jumps and the Markov-modulated reflected OU process. We prove that their stationary distributions exist. Furthermore, for the jump reflected OU process, the Laplace transform (LT) of the stationary distribution is given. As for the Markov-modulated reflected OU process, we derive an equation satisfied by the LT of the stationary distribution.

Primary Subjects: 91B70
Keywords: Ornstein--Uhlenbeck process; reflected process; Markov-modulated process; stationary distribution

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Links and Identifiers

Permanent link to this document: http://projecteuclid.org/euclid.jap/1253279847
Digital Object Identifier: doi:10.1239/jap/1253279847
Zentralblatt MATH identifier: 05611413

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